• Provides point-of-use purification • Alloy substrate • Self-regulating design HP2 helium purifier provides “point-of-use” purification of helium or other noble gases to sub-PPM levels of impurities. NP2 nitrogen purifier is similar to the helium model, purifying nitrogen to sub-PPM levels of gaseous impurities. Purification substrate is a non-evaporable gettering alloy which is contained in a welded assembly. Both purifiers can be used safely in industrial applications with minimal precautions. Self-regulating design is featured which eliminates possibility of thermal runaway and maintains getter material at optimum temperature.

Valco Instruments Co. Inc.
Box 55603
Houston, TX, 77255